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Atomic optics experiments can generate periodic atomic

distributions with ,100 nm features.1–4 Recent experimental

progress, such as the development of new atomic sources5

and flexible methods for guiding6,7 and patterning8 atoms,

suggests that future experiments hold promise for creating

atomic distributions with more arbitrary patterns or with

smaller characteristic length scales. Detection of position

distributions of alkali atoms with nm scale resolution is currently

a challenging problem. If an alkali atomic pattern is

deposited directly on a substrate, the pattern will be destroyed

upon exposure to atmosphere, since the alkali atoms

react immediately with dioxygen, water, and carbon dioxide.

Analysis in situ, using scanning tunneling microscopy, can

show features with sizes ,20 nm,9 but such techniques are

experimentally inconvenient. By using a resist/etch system to

transfer the pattern formed in cesium into a more durable

substrate, such as silicon, we create a copy of the pattern, in

a process loosely analogous to the way that photographic

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  • 1 decade ago
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    原子光學實驗能產生定期原子

    配給與一起,100納米特徵。 1-4新近實驗的

    發展,例如新原子sources5的發展

    以及guiding6,7 和patterning8 原子的靈活的方法,

    建議將來的實驗擁有物為建立許諾

    原子配給有更任意圖案或者有

    更小的特性長度規模。 位置的察覺

    有納米的鹼原子規模決定的配給是目前

    一個富於挑戰性的問題。 鹼原子圖案

    直接在一個底層上存,這種圖案將被破壞

    當對空氣的暴露時,從鹼原子起

    與dioxygen,水和二氧化碳立即起回應。

    在原處分析,使用掃描挖隧道顯微術,能

    有尺寸顯示特徵,20納米,9但是這樣的技術是

    實驗上不方便。 透過使用抗蝕劑/ 蝕刻系統

    轉移在銫裡形成進更多的耐用物品的這種圖案

    底層,例如矽,我們創造那些圖案,在方面

    鬆弛的一個過程對那麼攝影模式類似

    Source(s): 自己
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